집적회로공정 15강 - Diffusion

1. Dopant diffusion 2. Diffusion mechanisms in Si 3. Diffusion process modeling

집적회로공정 14강 - Ion implantation

1. Ion channeling 2. Implantation damage 3. Dopant activation

집적회로공정 13강 - Ion implantation

1. Dose vs. concentration 2. Junction depth 3. Sheet resistance of ion implanted layer 4. Ion channeling

집적회로공정 12강 - Ion implantation

1. Ion implantation 2. Concentration and dose 3. Energy loss mechanism

집적회로공정 11강 - Oxidation

1. Oxidation recipe 2. Oxidation source/method